发明名称 MASK BLANK, AND PHOTOMASK
摘要 A mask blank is provided to inhibit a tantalum-based semi-light transmitting film from being damaged by wet etching of a light shielding film, and to simplify the structure of a flat panel display device. A mask blank(20) for fabricating a flat panel display device comprises: a substrate(16); a semi-light transmitting film(17) formed on the substrate and comprising a tantalum-containing material; and a light shielding film(18) formed on the semi-light transmitting film and comprising a material containing chrome and nitrogen. The light shielding film comprising a material containing chrome and nitrogen has a multi-layer structure, wherein each layer contains chrome and nitrogen.
申请公布号 KR101333931(B1) 申请公布日期 2013.11.27
申请号 KR20110002950 申请日期 2011.01.12
申请人 发明人
分类号 G03F1/00;G03F1/32;G03F1/46;G03F1/50;G03F1/54;H01L21/027 主分类号 G03F1/00
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