| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus that shows high dispersibility of reaction gas and is capable of forming a film showing high in-plane uniformity.SOLUTION: A film-forming apparatus carries out a film-forming treatment by successively feeding a plurality of kinds of reaction gases and replacement gases to a substrate W placed between a placement part 2 and a ceiling part 31 inside a treatment chamber in a vacuum atmosphere. A central gas discharging part 4b is located above the center of the substrate W and is equipped with a gas discharging outlet 42 for diffusing the gases outward in a lateral direction. A surrounding gas feed part 5 is arranged to surround the central gas discharging part 4b and has a plurality of gas discharging outlets 511 and 512 formed along a circumferential direction such that each can diffuse the gases in a lateral direction toward the outer periphery and the center of the substrate W when viewed in a plane. |
