发明名称 PELLICLE AND PHOTOMASK
摘要 PROBLEM TO BE SOLVED: To provide a pellicle and a photomask mounting the pellicle which need no adhesive nor new facility introduction, and facilitate cleaning of the photomask after detachment of the pellicle.SOLUTION: Instead of mask adhesive for laminating a pellicle and a photomask, carbon nano-fiber 4 deposited at a formation density of one hundred million carbon nano-fibers or more per square millimeter is used as a mounting layer, and the pellicle is constituted to be mounted on the photomask with the molecular force of the carbon nano-fibers 4.
申请公布号 JP2013195950(A) 申请公布日期 2013.09.30
申请号 JP20120065902 申请日期 2012.03.22
申请人 TOPPAN PRINTING CO LTD 发明人 FURUYA HITOMI
分类号 G03F1/64 主分类号 G03F1/64
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