发明名称 METHOD OF MAKING LEAD SELENIDE-BASED SEMICONDUCTOR STRUCTURE
摘要 FIELD: physics.SUBSTANCE: method of making a lead selenide-based semiconductor structure, having a substrate and a lead selenide film, involves forming a polycrystalline lead selenide film and subsequent heat treatment thereof in an oxygen-containing medium, wherein according to the invention, the polycrystalline lead selenide film is formed on a substrate made from material having a temperature coefficient of linear expansion ranging from 10·10°Cto 26·10°C.EFFECT: invention enables to form lead selenide-based photosensitive and emitting structures.6 cl, 3 ex, 3 dwg
申请公布号 RU2493632(C1) 申请公布日期 2013.09.20
申请号 RU20120114585 申请日期 2012.04.12
申请人 OBSHCHESTVO S OGRANICHENNOJ OTVETSTVENNOST'JU "IKO" 发明人 NEPOMNJASHCHIJ SERGEJ VASIL'EVICH;POGODINA SOF'JA BORISOVNA
分类号 H01L31/0312;B82B1/00;H01L33/26 主分类号 H01L31/0312
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