| 摘要 |
PROBLEM TO BE SOLVED: To significantly improve accuracy of the film thickness or line width, or in-plane uniformity of a resist pattern after development processing in lithography.SOLUTION: An auxiliary exposing device (AE)10 of the present invention comprises: a flat-flowing conveyance section 30 for conveying a substrate G at a certain posture in one horizontal direction; a UV irradiation unit 32 for irradiating a resist on the substrate G with an ultraviolet (UV) of a predetermined wavelength; a light-emitting driving section 34 for supplying driving current for light emission to a light-emitting element in the UV irradiation unit 32; a cooling mechanism 36 for cooling the light-emitting element in the UV irradiation unit 32 to a preset temperature; an illuminance measurement section 38 for measuring the illuminance of ultraviolet irradiation by the UV irradiation unit 32; a control section 40 for controlling the sections in the device; and a memory 42. |
