发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity, chemical resistance and adhesiveness to a molybdenum substrate.SOLUTION: The photosensitive resin composition comprises: an acrylic polymer produced by at least co-polymerizing (a1) a structural unit having a residue of an acid group protected by an acid decomposable group and (a2) a structural unit having an epoxy group, oxetanyl group or a structural unit having -NH-CH-OR (where R represents an alkyl group having 1 to 20 carbon atoms); (B) a photo-acid generator; and (C) a vinyl ether compound. The (C) compound having a vinyl ether group includes 1 to 4 vinyl ether groups in the molecule and an alkylene oxide group and/or a hydroxy group, and has a molecular weight of 80 to 1000.
申请公布号 JP2013178439(A) 申请公布日期 2013.09.09
申请号 JP20120043196 申请日期 2012.02.29
申请人 FUJIFILM CORP 发明人 KASHIWAGI DAISUKE;HIKITA MASANORI;SUGIHARA KOICHI;ANDO TAKESHI
分类号 G03F7/039;C08F220/26;C08K5/06;C08L33/04;G03F7/004;H01L21/027;H01L51/50;H05B33/10;H05B33/22 主分类号 G03F7/039
代理机构 代理人
主权项
地址