发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND WAFER
摘要 PROBLEM TO BE SOLVED: To suppress a bump from being released from a semiconductor chip by being deposited to a probe needle.SOLUTION: A plurality of bumps BMP (first bumps) are formed in an effective area CHA of a wafer WF. The bumps BMP are formed on an active surface side of a semiconductor chip. Further, a plurality of dummy bumps DBMP1 are formed in an ineffective area DCHA of the wafer WF. Among the dummy bumps DBMP1, a part of bumps positioned in the outer-most circumference are dummy bumps DBMP2 (second dumps) smaller than the other bumps. The dummy bumps DBMP2 cross an inner circumferential side edge of a shading member CVL in a planar view. The dummy bumps DBMP2 are formed on a third pad electrode PAD3. An insulator film SR for bump formation is removed from surfaces of the overall third pad electrode PAD3.
申请公布号 JP2013168453(A) 申请公布日期 2013.08.29
申请号 JP20120029904 申请日期 2012.02.14
申请人 RENESAS ELECTRONICS CORP 发明人 YUTANI AKINORI;SOEJIMA KOJI
分类号 H01L21/60 主分类号 H01L21/60
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