发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can form an alignment mark used for manufacturing of a back side illumination solid-state imaging device (semiconductor device) in a smaller number of processes.SOLUTION: A semiconductor device comprises: a semiconductor layer SL including a first principal surface S1 and a second principal surface S2 opposite to the first principal surface S1; a plurality of photodiodes PD formed in the semiconductor layer SL for performing photoelectric conversion; light-receiving lenses LNS arranged above the second principal surface S2 of the semiconductor layer SL for supplying light to the photodiodes PD; and an alignment mark MK formed inside the semiconductor layer SL. The alignment mark MK includes a projection PR which extends from the first principal surface S1 toward the second principal surface S2 and projects from the second principal surface S2 in a direction where the light-receiving lenses LNS are arranged.
申请公布号 JP2013168617(A) 申请公布日期 2013.08.29
申请号 JP20120032574 申请日期 2012.02.17
申请人 RENESAS ELECTRONICS CORP 发明人 KASHIWABARA KEIICHIRO
分类号 H01L27/146;H04N5/374 主分类号 H01L27/146
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