| 发明名称 |
PREPARATION OF ZINCTIN OXIDE THIN FILMS |
| 摘要 |
<p>PURPOSE: A method for manufacturing a zinc tin oxide thin film is provided to form various zinc tin oxide thin films by controlling compositions. CONSTITUTION: A substrate is introduced into a deposition chamber. A zinc tin oxide thin film is manufactured by supplying tin, oxygen, and zinc. The zinc tin oxide thin film is manufactured by a chemical vapor deposition method or an atomic layer deposition method. The tin, the oxygen, and the zinc are supplied at the same time in the chemical vapor deposition method. The tin, the oxygen, and the zinc are alternatively supplied in the atomic layer deposition method.</p> |
| 申请公布号 |
KR20130091615(A) |
申请公布日期 |
2013.08.19 |
| 申请号 |
KR20120013032 |
申请日期 |
2012.02.08 |
| 申请人 |
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY |
发明人 |
LEE, SUN SOOK;LEE, BYUNG KOOK;CHUNG, TAEK MO;KIM, CHANG GYOUN;AN, KI SEOK;LEE, YOUNG KUK;JEONG, SEOG JONG;PARK, BO KEUN |
| 分类号 |
H01L21/20;H01L21/205;H01L21/336;H01L29/786 |
主分类号 |
H01L21/20 |
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