METHOD OF MANUFACTURING A SUCTION PAD WITH MICRO SUCTION ARRAY STRUCTURE

摘要

PURPOSE: A method for manufacturing an adsorbing pad with a fine adsorbing structure is provided to obtain a three-dimensional fine adsorbing structure using a semiconductor photolithography process and to ensure a vacuum state regardless of dry or wet states of an adsorbing material. CONSTITUTION: A method for manufacturing an adsorbing pad with a fine adsorbing structure comprises the steps of: forming a fine pattern in a first hemisphere shape using a first photolithography process and a thermal reflow process on a silicon substrate (b); manufacturing a mold forming a reverse shape in a fine adsorbing structure by forming the fine pattern of a second sensitizer by a second photolithography process on the silicon substrate (d); forming an adhesive preventing film on the mold; hardening the same by molding mixed solution of a curing agent and a polymer which is a material for the adsorbing pad on the mold (e); and separating the adsorbing pad from the mold (f). [Reference numerals] (AA) Start; (B1) Clean a silicon substrate; (B2) Step a; (C1) Coat a first sensitizer and form a fine pattern on a sensitizing layer; (C2) Step b; (D1) Thermal reflow process; (D2) Step c; (E1) Coat a second sensitizer and form a fine pattern on a sensitizing layer; (E2) Step d; (F1) Polymer molding process; (F2) Step e; (G1) Separate an adsorbing pad from a mold; (G2) Step f; (HH) End