| 摘要 |
PURPOSE: A heater of a valve for chemical vapor deposition is provided to prevent powder generated in a CVD process using large amount of gas from being coagulated in every place by comprising the heater heating the outside of a valve body. CONSTITUTION: A heater of a valve for chemical vapor deposition comprises a housing unit, a connection pipe accommodating groove unit, a first heating unit(50), and a second heating unit. The housing unit includes a hollow semicircle cylinder type upper housing(10) and a hollow semicircle cylinder type lower housing(20). The connection pipe accommodating groove unit is formed by connecting a first connection pipe accommodating groove(11) and a second connection pipe accommodating groove(21). The first heating unit contacts with one surface of a shield casing and heats the one surface of the shield casing. The second heating unit contacts with the other surface of the shield casing and heats the other surface of the shield casing. [Reference numerals] (AA) Hollow part
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