发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination optical system capable of accurately realizing a desired polarization state of a pupil intensity distribution. <P>SOLUTION: An illumination optical system which lights up a surface to be irradiated with light from a light source has a plurality of optical elements arrayed on a prescribed surface and individually controlled, and comprises: a spatial light modulator which forms variably a light intensity distribution on an illumination pupil of the illumination optical system; a polarization member which is located in a position near the prescribed surface or in a conjugate space including a surface optically conjugate to the prescribed surface and changes the polarization states of some of propagation light beams propagating in a light path; and a light intensity distribution uniforming member which is located in a light path between the light source and the polarization member and improves the uniformity of the intensity distribution of light made incident on the prescribed surface. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013084958(A) 申请公布日期 2013.05.09
申请号 JP20120223639 申请日期 2012.10.05
申请人 NIKON CORP 发明人 CHAEN KOTA;MORI KOJI
分类号 H01L21/027 主分类号 H01L21/027
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