| 摘要 |
<P>PROBLEM TO BE SOLVED: To utilize a high resolution region in a most effective manner and improve throughput by increasing the number of chip patterns per shot and fitting reticle patterns with each other without space therebetween without complicating the step feeding. <P>SOLUTION: In a reticle 2 for exposure where a reticle pattern 22 constituted of a plurality of chip patterns 21 is placed in a circular effective exposure region 23 of a stepper apparatus 10, the reticle pattern 22 has 12 chip patterns 21 where chip patterns at four corners are taken out from 4×4 or 16 chip patterns 21, or in another point of view, where chip patterns 21 protrude from all four sides of the reticle pattern 22 constituted of 2×2 or 4 chip patterns 21, with two chip patterns 21 protruding to each of the top and bottom and also two chip patterns 21 protruding to each of the left and right. <P>COPYRIGHT: (C)2013,JPO&INPIT |
