发明名称 |
OPTICAL SYSTEM AND MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.
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申请公布号 |
US2013100429(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
US201213715000 |
申请日期 |
2012.12.14 |
申请人 |
CARL ZEISS SMT GMBH;CARL ZEISS SMT GMBH |
发明人 |
FIOLKA DAMIAN;BAIER JUERGEN |
分类号 |
G03F7/20;G01B11/14;G02B5/09 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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