| 摘要 |
PURPOSE: A photosensitive resin composition is provided to improve patterning, heat resistance, and chemical resistance and to allow easy patterning. CONSTITUTION: A manufacturing method of an organic phosphorous-containing acryl copolymer represented by chemical formula 1 comprises a reaction of dialkyl or aryl phosphoryl halide with hydroxyalkyl group-containing acryl copolymer. In chemical formula 1, R1 is hydrogen or C1-20 alkyl, aryl, alkylaryl, cycloalkyl, multicycloalkyl, R2 is C1-6 alkyl group, R3 is C1-20 alkyl, aryl, alkylaryl, cycloalkyl, and multi cycloalkyl. The photosensitive resin composition includes a copolymer with a repeating unit represented by chemical formula 2, acrylic photopolymerizable monomer, photopolymerizable initiator, pigment, and solvent.
|
