发明名称 |
PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE |
摘要 |
<p>A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid and (B) a low molecular weight compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and decomposing by an action of an acid to decrease a solubility of the low molecular weight compound (B) in an organic solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.</p> |
申请公布号 |
WO2013047091(A1) |
申请公布日期 |
2013.04.04 |
申请号 |
WO2012JP72285 |
申请日期 |
2012.08.28 |
申请人 |
FUJIFILM CORPORATION;TSUBAKI, HIDEAKI;TAKIZAWA, HIROO;KAWABATA, TAKESHI |
发明人 |
TSUBAKI, HIDEAKI;TAKIZAWA, HIROO;KAWABATA, TAKESHI |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|