发明名称 SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM WHICH STORES SUBSTRATE TREATMENT PROGRAM
摘要 <p>The present invention provides a substrate treatment device (1) for treating a substrate (2) in a substrate treatment chamber (7), in which a cover (5) of a carrier (3) loaded onto a carrier loading base (6) is opened and the substrate (2) housed in the carrier (3) is transported to the substrate treatment chamber (7), a substrate treatment method and a substrate treatment program. If (a) specific condition(s) is(are) fulfilled when a first carrier (3) loaded onto the carrier loading base (6) is being treated, the cover (5) of the second carrier (3) is opened and treatment of the substrate (2) starts.</p>
申请公布号 WO2013042726(A1) 申请公布日期 2013.03.28
申请号 WO2012JP74061 申请日期 2012.09.20
申请人 TOKYO ELECTRON LIMITED;NASU MASAHIRO;ITOU KOUICHI;WADA SHIGEKI;OKAMURA KOUJI 发明人 NASU MASAHIRO;ITOU KOUICHI;WADA SHIGEKI;OKAMURA KOUJI
分类号 H01L21/677;H01L21/304 主分类号 H01L21/677
代理机构 代理人
主权项
地址
您可能感兴趣的专利