发明名称 |
SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM WHICH STORES SUBSTRATE TREATMENT PROGRAM |
摘要 |
<p>The present invention provides a substrate treatment device (1) for treating a substrate (2) in a substrate treatment chamber (7), in which a cover (5) of a carrier (3) loaded onto a carrier loading base (6) is opened and the substrate (2) housed in the carrier (3) is transported to the substrate treatment chamber (7), a substrate treatment method and a substrate treatment program. If (a) specific condition(s) is(are) fulfilled when a first carrier (3) loaded onto the carrier loading base (6) is being treated, the cover (5) of the second carrier (3) is opened and treatment of the substrate (2) starts.</p> |
申请公布号 |
WO2013042726(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
WO2012JP74061 |
申请日期 |
2012.09.20 |
申请人 |
TOKYO ELECTRON LIMITED;NASU MASAHIRO;ITOU KOUICHI;WADA SHIGEKI;OKAMURA KOUJI |
发明人 |
NASU MASAHIRO;ITOU KOUICHI;WADA SHIGEKI;OKAMURA KOUJI |
分类号 |
H01L21/677;H01L21/304 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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