| 摘要 |
<p>The present invention relates to a method for measuring the film thickness of a sample having a textured surface, comprising the steps of: measuring a reference reflectivity of a basic sample having a non-textured flat surface; measuring a first reflectivity of a first sample obtained by enabling the surface of the basic sample to be textured, and obtaining texture structure information from the relationship between the reference reflectivity and the first reflectivity; measuring a second reflectivity of a second sample obtained by forming a thin film on the surface of the first sample; obtaining a third reflectivity of a third sample, formed by forming a thin film on the surface of the basic sample, using the texture structure information and the second reflectivity information; and calculating the thickness of the thin film using the third reflectivity. According to the present invention, the thickness of the thin film formed on the textured surface can be accurately measured, and more particularly, the reflection state of a surface of a solar cell can be accurately checked if the solar cell has a textured surface, and thus processes can be controlled.</p> |
