发明名称 |
A pellicle for lithography and a method of making thereof |
摘要 |
A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of rectangle) so that the angle alpha (±) included between the side wall of the agglutinant layer and said annular face is 90 degrees or smaller. |
申请公布号 |
EP2568336(A2) |
申请公布日期 |
2013.03.13 |
申请号 |
EP20120006305 |
申请日期 |
2012.09.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
NAGATA, YOSHIHIKO |
分类号 |
G03F1/64;G03F1/00 |
主分类号 |
G03F1/64 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|