发明名称 A pellicle for lithography and a method of making thereof
摘要 A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of rectangle) so that the angle alpha (±) included between the side wall of the agglutinant layer and said annular face is 90 degrees or smaller.
申请公布号 EP2568336(A2) 申请公布日期 2013.03.13
申请号 EP20120006305 申请日期 2012.09.06
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 NAGATA, YOSHIHIKO
分类号 G03F1/64;G03F1/00 主分类号 G03F1/64
代理机构 代理人
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