| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scroll type vacuum pump suitable for a case of sucking special gas with reactivity in a semiconductor manufacturing process or the like. <P>SOLUTION: There is provided the scroll type vacuum pump in which a fixed spiral lap provided on a fixed scroll and an orbiting spiral lap provided on an orbiting scroll are fitted into each other in a compression chamber 5 provided in a housing, the orbiting scroll can be orbited with respect to the fixed scroll without rotation, and a rotation preventive mechanism parts for preventing the rotational motion of the orbiting scroll are disposed. In the scroll type vacuum pump, annular grooves 11c for communicating spaces around the rotation preventive mechanism parts 8a, 8b, 8c with each other are formed in an end face of a casing 11, opposite to the orbiting scroll, and inert gas is introduced from inlet holes 11d formed in the annular grooves 11c. <P>COPYRIGHT: (C)2013,JPO&INPIT |
