发明名称 |
RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS INCLUDING RF POWER FILTERS |
摘要 |
<p>A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.</p> |
申请公布号 |
SG187212(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
SG20130006283 |
申请日期 |
2011.07.28 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
LONG, MAOLIN;LU, RALPH;EGLEY, FRED;ANDERSON, THOMAS;JAFARIAN-TEHRANI, SEYED JAFAR;GIARRATANO, MICHAEL |
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