发明名称 MRAM Device and Fabrication Method Thereof
摘要 According to an embodiment, a magnetoresistive random access memory (MRAM) device comprises a bottom electrode, a stack, a dielectric material, a dielectric layer, and a conductive material. The bottom electrode is over a substrate, and the stack is over the bottom electrode. The stack comprises a magnetic tunnel junction (MTJ) and a top electrode. The dielectric material is along a sidewall of the stack, and the dielectric material has a height greater than a thickness of the MTJ and less than a stack height. The dielectric layer is over the stack and the dielectric material. The conductive material extends through the dielectric layer to the top electrode of the stack.
申请公布号 US2013026585(A1) 申请公布日期 2013.01.31
申请号 US201113190966 申请日期 2011.07.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.;SUNG FU-TING;LIU SHIH-CHANG;TSAI CHIA-SHIUNG 发明人 SUNG FU-TING;LIU SHIH-CHANG;TSAI CHIA-SHIUNG
分类号 H01L29/82;H01L43/12 主分类号 H01L29/82
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