| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which prevent an SPM liquid from re-adhering to a substrate during SPM processing. <P>SOLUTION: A top plate rotation mechanism, rotating a top plate 32 on a horizontal surface, is provided at the top plate 32. A cylindrical cup outer peripheral cylinder 50 disposed around a cup 40 moves up and down between a rise position where an upper end of the cup outer peripheral cylinder 50 is placed above the cup 40 and a lowered position located lower than the rise position. A nozzle supporting arm 82 supporting a nozzle 82a moves in a horizontal direction between an advanced position where the nozzle supporting arm 82 moves into the cup outer peripheral cylinder 50 through a side surface opening 50m located on a side surface of the cup outer peripheral cylinder 50 when the cup outer peripheral cylinder 50 is positioned at the rise position and a retreated position where the nozzle supporting arm 82 retreats from the cup outer peripheral cylinder 50 to the exterior. <P>COPYRIGHT: (C)2013,JPO&INPIT |
