发明名称 Semiconductor material
摘要 A semiconductor device which comprises a channel layer formed from a semiconductor channel component material in the form of crystalline micro particles, micro rods, crystalline nano particles, or nano rods, and doped with a semiconductor dopant.
申请公布号 US8362479(B2) 申请公布日期 2013.01.29
申请号 US20110986535 申请日期 2011.01.07
申请人 PANASONIC CORPORATION;CAMBRIDGE ENTERPRISE LTD.;MORI KIYOTAKA;SIRRINGHAUS HENNING 发明人 MORI KIYOTAKA;SIRRINGHAUS HENNING
分类号 H01L29/10 主分类号 H01L29/10
代理机构 代理人
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