发明名称 Microstructure device including a metallization structure with self-aligned air gaps and refilled air gap exclusion zones
摘要 In a sophisticated metallization system, self-aligned air gaps may be provided in a locally selective manner by using a radiation sensitive material for filling recesses or for forming therein the metal regions. Consequently, upon selectively exposing the radiation sensitive material, a selective removal of exposed or non-exposed portions may be accomplished, thereby resulting in a highly efficient overall manufacturing flow.
申请公布号 US8344474(B2) 申请公布日期 2013.01.01
申请号 US20100708230 申请日期 2010.02.18
申请人 ADVANCED MICRO DEVICES, INC.;SEIDEL ROBERT;WERNER THOMAS 发明人 SEIDEL ROBERT;WERNER THOMAS
分类号 H01L21/70 主分类号 H01L21/70
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