发明名称 |
Microstructure device including a metallization structure with self-aligned air gaps and refilled air gap exclusion zones |
摘要 |
In a sophisticated metallization system, self-aligned air gaps may be provided in a locally selective manner by using a radiation sensitive material for filling recesses or for forming therein the metal regions. Consequently, upon selectively exposing the radiation sensitive material, a selective removal of exposed or non-exposed portions may be accomplished, thereby resulting in a highly efficient overall manufacturing flow.
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申请公布号 |
US8344474(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US20100708230 |
申请日期 |
2010.02.18 |
申请人 |
ADVANCED MICRO DEVICES, INC.;SEIDEL ROBERT;WERNER THOMAS |
发明人 |
SEIDEL ROBERT;WERNER THOMAS |
分类号 |
H01L21/70 |
主分类号 |
H01L21/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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