| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask and a manufacturing method for the same, that can suppress leakage light and achieve high dimensional accuracy and high positional accuracy. <P>SOLUTION: A photomask includes: a device pattern formed on a first region of a transparent substrate; a peripheral pattern formed on a second region of the transparent substrate; and a modification layer formed within the transparent substrate in a region provided with the peripheral pattern, and making the transmittance of a light-transmitting part of the peripheral pattern relative to exposure light used for light-exposing the device pattern on a wafer lower than the transmittance of a light-transmitting part of the device pattern relative to the exposure light. <P>COPYRIGHT: (C)2013,JPO&INPIT |
