| 发明名称 |
COMPOSITION AND METHOD FOR POLISHING BULK SILICON |
| 摘要 |
<p>The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increase the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.</p> |
| 申请公布号 |
SG184307(A1) |
申请公布日期 |
2012.11.29 |
| 申请号 |
SG20120071874 |
申请日期 |
2011.04.06 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
REISS, BRIAN;WHITE, MICHAEL;JONES, LAMON;CLARK, JOHN |
| 分类号 |
B24B37/02 |
主分类号 |
B24B37/02 |
| 代理机构 |
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