| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition from a resist pattern having good CD (critical dimension) uniformity and fewer defects can be produced. <P>SOLUTION: The resist composition includes: (A1) a resin having a structural unit expressed by formula (I); (A2) a resin having a structural unit expressed by formula (II), which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; and (B) an acid generator. In the formulae, R<SP POS="POST">2</SP>represents a hydrocarbon group having a fluorine atom; and ring T<SP POS="POST">1</SP>represents a sultone ring. <P>COPYRIGHT: (C)2013,JPO&INPIT |
