发明名称 Semiconductor device with solder bump formed on high topography plated Cu pads
摘要 A semiconductor device has a first conductive layer formed over a substrate. A first insulating layer is formed over the substrate and first conductive layer. A second conductive layer is formed over the first conductive layer and first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. The second insulating layer has a sidewall between a surface of the second insulating material and surface of the second conductive layer. A protective layer is formed over the second insulating layer and surface of the second conductive layer. The protective layer follows a contour of the surface and sidewall of the second insulating layer and second conductive layer. A bump is formed over the surface of the second conductive layer and a portion of the protective layer adjacent to the second insulating layer. The protective layer protects the second insulating layer.
申请公布号 US8304904(B2) 申请公布日期 2012.11.06
申请号 US20100700114 申请日期 2010.02.04
申请人 LIN YAOJIAN;ZHANG QING;CAO HAIJING;STATS CHIPPAC, LTD. 发明人 LIN YAOJIAN;ZHANG QING;CAO HAIJING
分类号 H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/48
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