| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a phase defect correction method of reflection type mask which allows for accurate phase defect correction of a reflection type mask without causing any damage thereon. <P>SOLUTION: In the phase defect correction method of reflection type mask, phase difference between a phase defect part and a high reflection part is practically brought to 0 (zero) by laminating a multilayer film composed of two kinds of material on the phase defect part, and the reflectance of the phase defect part is substantially equalized to the reflectance of the high reflection part. Phase defect can be corrected by laminating a multilayer film for correction, even for a protrusion defect directly above a substrate and a protrusion defect in the center of the multilayer film. <P>COPYRIGHT: (C)2013,JPO&INPIT |
