FABRICATION OF MULTILAYER COLLOIDAL SEMICONDUCTOR NANOPARTICLE

摘要

PURPOSE: A method for forming multilayer thin firm of a colloid semiconductor nanoparticle is provided to laminate a semiconductor nanoparticle by reforming the surface of the semiconductor nanoparticle. CONSTITUTION: Nano particles(11) in which the surface is reformed are formed in a stamp(10). The nano particles formed in the stamp contact an element and gravitation between the nano particles is strengthened. A thin film is transferred. The nano particles are one or more species selected from a group consisting of a metal oxide or an II-VI group material, an III-V group material, an IV-IV group material, and an IV-VI group material.