发明名称 COMPOSITION FOR FORMING CONDUCTIVE PATTERN AND METHOD FOR FORMING CONDUCTIVE PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for forming a conductive pattern, by using which a fine conductive pattern can be applied and drawn on a semiconductor substrate using a printing method such as an inkjet method and stamp method, a conductive circuit having stress resistance can be obtained by forming cross linking in the drawn circuit by a hardener included in the composition so that the composition is cured to be rubbery, and thereby a finer conductive circuit can be achieved and a highly reliable semiconductor circuit can be formed. <P>SOLUTION: A composition for forming a conductive pattern of the present invention is obtained by blending conductive fine particles having a maximum particle size of less than 1 &mu;m with a silicone rubber composition containing a curable organopolysiloxane and a hardener. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012169212(A) 申请公布日期 2012.09.06
申请号 JP20110031004 申请日期 2011.02.16
申请人 SHIN ETSU CHEM CO LTD 发明人 HAMADA YOSHITAKA;YAGIHASHI FUJIO
分类号 H01B1/20;B05D1/26;B05D5/12;B05D7/24;B41M5/00;C08K3/08;C08K9/02;C08L83/04;C09D11/00;C09D11/38;C09D11/52;H01B1/22;H01B1/24;H01B13/00;H01L21/288;H05K1/09 主分类号 H01B1/20
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