| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing device which activates a large amount of processing gas and supplies the gas without deactivating the gas. <P>SOLUTION: A substrate processing device includes: a substrate support body 3 supporting a substrate W, a catalyst plate 5, a first processing gas supply part 70a supplying a first processing gas activated through contact with the catalyst plate 5, and an induction heating coil 6 inductively heating the catalyst plate 5. The substrate support body 3 is disposed on one surface of the catalyst plate 5, and the induction heating coil 6 is disposed on the other surface of the catalyst plate 5. The catalyst plate 5 divides a processing chamber 1 into a first space on the induction heating coil 6 side and a second space on the substrate support body 3 side. <P>COPYRIGHT: (C)2012,JPO&INPIT |
