发明名称 Method for Manufacturing a Semiconductor Component
摘要 A semiconductor component having a low resistance conduction path and a method for manufacturing the semiconductor component. When the semiconductor component is a Schottky diode, one or more trenches are formed in an epitaxial layer of a first conductivity type that is formed over a semiconductor substrate of the first conductivity type. The trenches may extend into the semiconductor material. Epitaxial semiconductor material of a second conductivity type is selectively grown along the sidewalls of the trenches. An anode contact is formed in contact with the epitaxial layer and the selectively grown epitaxial material and a cathode contact is formed in contact with the semiconductor substrate.
申请公布号 US2012208353(A1) 申请公布日期 2012.08.16
申请号 US201213453803 申请日期 2012.04.23
申请人 QUDDUS MOHAMMED TANVIR 发明人 QUDDUS MOHAMMED TANVIR
分类号 H01L21/20 主分类号 H01L21/20
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