发明名称 METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a transparent conductive film, which can lower a resistance of a metal silver portion without causing deterioration and the like in display quality of the metal silver portion even when the metal silver portion is irradiated with light from a xenon lamp, and can lower a surface resistance of a transparent conductive film to be produced when the transparent conductive film is produced by exposing a silver salt emulsion layer and then subjecting the silver salt emulsion layer to developing treatment, and to provide the transparent conductive film. <P>SOLUTION: The method for producing the transparent conductive film 10 comprises: a first exposing step of subjecting a photosensitive material that has the silver salt emulsion layer 24 formed on a base 12 to exposing treatment; and a developing step of subjecting the silver salt emulsion layer 24 after the exposing treatment to the developing treatment and forming a conductive pattern 16 of the metal silver portion 14 on the base 12. The method further comprises a second exposing step of irradiating the metal silver portion 14 after the developing treatment with pulse light from the xenon flash lamp. A volume ratio of silver/a binder in the silver salt emulsion layer 24 of the photosensitive material is 0.5/1 or more and 6/1 or less. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012146548(A) 申请公布日期 2012.08.02
申请号 JP20110004791 申请日期 2011.01.13
申请人 FUJIFILM CORP 发明人 TOKUNAGA TSUKASA;SASAKI HIROTOMO
分类号 H01B13/00;G03C1/00;H01B5/14 主分类号 H01B13/00
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