发明名称 Distributed Metal Routing
摘要 A system and method for a distributed metal routing is disclosed. An embodiment comprises a metal_0 layer with a metal_1 layer overlying the metal_0 layer. The metal_1 layer comprises separate parallel lines, with lines having different signals being distributed across the metal_1 layer. Such a layout decreases the parasitic resistance within the metal_0 layer as it decreases the distance current travels. Additionally, the distributed layout in metal_1 allows connections to be made to a metal_2 layer without the need for a hammer head connection of vias.
申请公布号 US2012181707(A1) 申请公布日期 2012.07.19
申请号 US201113007235 申请日期 2011.01.14
申请人 XIAO YOU-CHENG;CHEN YEN-HUEI;CHEN JUNG-HSUAN;CHOU SHAO-YU;TIEN LI-CHUN;LIAO HUNG-JEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 XIAO YOU-CHENG;CHEN YEN-HUEI;CHEN JUNG-HSUAN;CHOU SHAO-YU;TIEN LI-CHUN;LIAO HUNG-JEN
分类号 H01L23/48;H01L21/28 主分类号 H01L23/48
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