| 摘要 |
A shutter device for a lithography apparatus includes a housing for maintaining an ultrahigh vacuum. A disk within the housing is rotatable about a rotation axis. The disk has at least one opening arranged on a circumferential line around the rotation axis and serving for transmitting ultraviolet light. A lithography apparatus includes such a shutter device, as well as a light source for ultraviolet light, an optical unit for imaging a pattern onto a target surface, and a camera device for detecting the imaged pattern. |
