| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment capable of measuring a position of a wafer stage with high accuracy. <P>SOLUTION: Exposure equipment comprises a position measuring system having a plurality of heads including a plurality of first heads 65 and 64 provided corresponding to a pair of measurement surfaces extendedly arranged in a Y-axis direction in the vicinity of both end portions of a top surface of a wafer stage in an X-axis direction, respectively, and each having a measuring direction of the X-axis direction, each for emitting a measuring beam to a first irradiation point on the corresponding measurement surface and receiving return light of the measuring beam returned from the measurement surface, the position measuring system for obtaining positional information of the wafer stage at least in an X-Y plane based on outputs from the plurality of heads. The first irradiation point is positioned on a straight line in the X-axis direction passing through the irradiation center of the illumination light. Accordingly, the first head can measure a position of the wafer stage at least in the X-axis direction without an Abbe error. <P>COPYRIGHT: (C)2012,JPO&INPIT |
