| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method and pattern forming apparatus capable of forming satisfactory fine patterns by preventing pattern blurring when fine patterns are formed using an ink-jet method. <P>SOLUTION: The pattern forming method includes: a modification treatment process of irradiating a target treatment region, which corresponds to a pattern (12) formed on a pattern formation surface (10A) of a substrate (10) and includes the outer edges at both sides in the width direction of the pattern, with a light beam (20) having a width smaller than the diameter of a dot (26) forming the pattern to thereby subjecting the target treatment region to a modification treatment; and a droplet ejection process of ejecting droplets of a functional liquid by an ink-jet method onto the pattern formation region including the target treatment region which has been subjected to the modification treatment. An exposure resolution in the modification treatment is preferably at least 10 times higher than a dot resolution. In addition, the method preferably includes a reaction gas supply process of supplying a reaction gas to the substrate under the modification treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT |
