| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a filter exposure apparatus capable of reducing the time of mounting a substrate on a chuck or moving the substrate from the chuck and reducing exposure unevenness on the substrate surface. <P>SOLUTION: The filter exposure apparatus 10 is equipped with a light source mechanism 20 including a light source 20a that irradiates a substrate 12 with light, an exposure mask 16 disposed below the light source mechanism 20, and a stage mechanism 17 disposed below the exposure mask 16 and mounting the substrate 12. The stage mechanism 17 includes a base 15 and a chuck 13 disposed above the base 15 and mounting the substrate 12. A notch 13a where a robot hand 18 is inserted to mount the substrate 12 on the chuck 13 is formed on a chuck upper face 13A of the chuck 13, wherein at least a face 13b of the chuck upper face 13A except for the notch 13a comprises a porous surface. <P>COPYRIGHT: (C)2008,JPO&INPIT |
