发明名称 Multilayer interconnection substrate and method of manufacturing the same
摘要 A multilayer interconnection substrate is disclosed that includes a multilayer interconnection layer having at least a first interconnection layer and a second interconnection layer stacked with an insulating layer provided therebetween, and a connection via configured to electrically connect the first interconnection layer and the second interconnection layer. The connection via includes an internal conductor and a metal film covering the internal conductor. The internal conductor is an aggregate of metal particles.
申请公布号 US8158503(B2) 申请公布日期 2012.04.17
申请号 US20060474453 申请日期 2006.06.26
申请人 ABE TOMOYUKI;FUJITSU LIMITED 发明人 ABE TOMOYUKI
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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