| 摘要 |
There is provided a profile measuring apparatus which measures a profile of an object, including an imaging element; an image formation optical system including an objective lens; a measuring direction changing unit which is configured to change inclination of a surface of the object with respect to the objective lens based on information of the inclination of the surface of the object so that a light flux enters the objective lens with an aperture angle not less than a predetermined degree; and a measuring unit which is configured to measure the profile of the object based on the image, of the object on which the pattern is projected, obtained by the imaging element. |
