| 摘要 |
Layout design data is analyzed to identify both potential geometric element cuts in the design and instances of an application of a separation directive. Each of the identified separation directive instances and the identified cuts are assigned an analysis value, such as a weight value. The separation directive instances and the identified cuts then are ordered in a single list according to their analysis values. Each item on the list is then analyzed, to determine if the item can be implemented in the layout design data without creating a conflict in complementary pattern sets for using in a double-patterning lithographic technique. If a list item (either separation directive instance or identified cut) cannot be implemented without creating a conflict in one of the complementary patterns, then it is discarded from the list. After each of the list items has been analyzed, the remaining items are implemented in the design layout data. |
