SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PLATE MEMBER, AND WALL

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding device capable of suppressing immersion of liquid from a gap formed in at least a part of a periphery of an edge of a substrate.

SOLUTION: A substrate holding device holds a substrate exposed by exposure light through liquid. The substrate holding device comprises an opening and a first holding part having a holding surface for holding the substrate in the opening. At least a part of an edge part that defines the opening has a first surface and a second surface that is provided above the first surface and is nonparallel to the first surface. The second surface extends from a boundary part between the first surface and the second surface upward and toward the outside with respect to a center of the opening. The boundary part between the first surface and the second surface is almost as high as a surface of the substrate held by the first holding part, or higher than the surface of the substrate.

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