ATOMIC DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD,申请号KR20107019467-传众专利搜索

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发明名称	ATOMIC DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD
摘要
申请公布号	KR101111494(B1)	申请公布日期	2012.02.23
申请号	KR20107019467	申请日期	2009.02.17
申请人		发明人
分类号	H01L21/20;C23C16/452;H05H1/46	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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