摘要 |
<p>PURPOSE: A substrate cleaning/drying apparatus, a substrate processing apparatus including the same, a substrate cleaning/drying method thereof, and a display panel manufacturing method are provided to switch a vertical or horizontal transfer direction of a substrate using a plurality of hand forks, thereby improving productivity by reducing a transfer time of the substrate. CONSTITUTION: A base frame(100) is classified into an upper layer(110) and a lower layer(120). A first substrate transfer part(200) is installed on the upper layer. A second substrate transfer part(300), a substrate handling part(500), and a fourth substrate transfer part(600) are installed on the lower layer. A third substrate transfer part(400) is installed on one side part of the lower layer and the upper layer. A fifth substrate transfer part(700) is installed on the other side part of the lower layer and the upper layer.</p> |