发明名称 METHOD FOR HANDLING SEMICONDUCTOR WAFER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for handling a semiconductor wafer capable of easily handling a thin semiconductor wafer while inexpensively securing the strength and the rigidity of the thin semiconductor wafer. <P>SOLUTION: A surface 2 of a support substrate 1 is freely attachably/detachably adhered to a weak adhesive surface 11 of a flexible adhesive layer 10, a strong adhesive surface 12 of the adhesive layer 10 is freely attachably/detachably adhered to a thin semiconductor wafer W, and the support substrate 1 is integrated with the thin semiconductor wafer W, thereby the thin semiconductor wafer W is handled by providing the strength and the rigidity to the thin semiconductor wafer W. Thereby the equipment investment is suppressed to the minimum, the strength and the rigidity of the thin semiconductor wafer W are secured and the thin semiconductor wafer W can be handled safely and inexpensively, because there is no need to use a dedicated holding jig and related equipment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033737(A) 申请公布日期 2012.02.16
申请号 JP20100172455 申请日期 2010.07.30
申请人 SHIN ETSU POLYMER CO LTD 发明人 ODAJIMA SATOSHI
分类号 H01L21/02;H01L21/683 主分类号 H01L21/02
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