发明名称 Integrated circuit system employing back end of line via techniques
摘要 An integrated circuit system that includes: providing a substrate including front-end-of-line circuitry; forming a first metallization layer over the substrate and electrically connected to the substrate; forming a viabar or a via group over the first metallization layer; and forming a second metallization layer over the first metallization layer and electrically connected to the first metallization layer through either the viabar or the via group.
申请公布号 US8115276(B2) 申请公布日期 2012.02.14
申请号 US20080132342 申请日期 2008.06.03
申请人 ZHANG SHAOQING;ZHANG FAN;CHU SHAO-FU SANFORD;ZHANG BEI CHAO;GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 ZHANG SHAOQING;ZHANG FAN;CHU SHAO-FU SANFORD;ZHANG BEI CHAO
分类号 H01L21/283;H01L21/02;H01L29/92 主分类号 H01L21/283
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