| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the accuracy of an image sensor during reticle alignment. <P>SOLUTION: Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of the patterning device and the substrate, and comprises imparting a radiation beam onto an alignment structure on the patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing the resultant aerial image, in which the relative positions of the image sensor and the substrate being known or subsequently determined; and measuring features of the image and thereby determining the location of the alignment structure relative to the image sensor. In the method, an alternative scanning scheme is used, in which, for example, two or more scans through the whole target volume are performed, having total duration being the same as a conventional single continuous scan. <P>COPYRIGHT: (C)2012,JPO&INPIT |
