| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide pellicles for lithography that allows a wider range of transmissivity to inclinedly incident beams, in a photolithographic procedure. Ž<P>SOLUTION: The pellicles used in photolithography that uses ArF excimer laser beams with a pellicle membrane having a thickness of 400 nm or smaller, when the pellicle membrane exhibits a local maximum transmissivity to a vertically incident ArF excimer laser beam. In addition, the pellicle membrane has a local maximum transmissivity with respect to an inclined incident ArF excimer laser beam. Here, the angle of the inclined incidence is preferably 13.4 degrees, and the pellicle membrane has preferably a thickness of ≤600 nm, in particular, has a thickness in a range selected from among 560 to 563 nm, 489 to 494 nm, 418 to 425 nm, 346 to 355 nm, 275 to 286 nm, and 204 to 217 nm. Ž<P>COPYRIGHT: (C)2008,JPO&INPIT Ž</p> |
